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                  MueTec provides highest precision and repeatability for production qualification of photomasks, including but not limited to COG (chrome on glass) and PSM (phase shift masks). Measurements include the distribution of CD uniformity on the mask. We offer visible light and UV light illumination in both reflective and transmitted mode. UV illumination is used to measure feature sizes down to 300 nm. 3-sigma repeatability is typically in the nanometer range.

                  For incoming mask inspection, we also provide long-distance objective lenses for measurements through pellicle. 


                  PRODUCTS
                  • DaVinci 270UV
                    Mask CD Metrology
                    DaVinci 270UV

                    Typical Applications

                    Critical Dimension Metrology


                    Features

                    Cost effective solution for mask layers with feature sizes of 300nm and above

                    UV and visable light capability

                    Reflected and transmitted light

                    Highest quality opticcs

                    Flexible tool configurations available

                    CD repeatability (3 sigma) long term < 4 nm (etched layer) 

                  • MT270UV
                    UV
                    MT270UV